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Most notably, the increases to existing fees include:
US National Application base filing fees will increase from 1,660 USD to 1,810 USD (664 USD to 724 USD for Small Entities).
Base filing fees for Nonprovisional applications filed directly in the U.S. under 35 U.S.C. 111(a), including divisional or continuation applications of National Stage Applications, will increase from 1,820 USD to 2,000 USD (728 USD to 800 USD for Small Entities).
Excess claim fees will significantly increase – double for excess claims over twenty (20)! Accordingly, it is highly recommended to reduce claims to 20 total / 3 independent claims, upon filing or shortly after filing.
RCE fees will significantly increase as well, particularly for the 2nd+ RCE. Given the high cost of an RCE, an Applicant may strongly wish to consider entering the Appeal process. For comparison, the costs for entering the Appeal process (fees of which will also increase) are also listed below.
Extension fees will increase as well, rendering non-timely filed responses more costly than ever.
The fee for proceeding from allowance to issuance of a US Patent (Issue Fee) will increase slightly: $1,200 -> $1,290 (Large Entity) and $480 -> $516 (Small Entity).
Effective January 19, 2025, there are also new fees for continuing applications (continuation, divisional, or continuation-in-part applications) filed over 6 years and 9 years from the application’s earliest benefit date, as well as new fees for IDS listings with over 50 cumulative cited references. The new fees are presented below:
Of note, the earliest benefit date (EBD) cannot be the filing date of a foreign application or the filing date of a provisional application to which benefit is claimed under 35 U.S.C. 119(e).
There will be new fees, based on the total number of cited references to the USPTO in an IDS, when greater than fifty (50) references.
For more information and the specific fees, please see Federal Guidelines
If you have any questions on this article or on US patents generally, please contact a member of our US IP Team.